中国矿业大学主页平台系统李远哲--中文主页-- Advancements in greenhouse gas emission reduction methodology for uorinated compounds and N2O in the semiconductor industry via abatement systems

论文成果

Advancements in greenhouse gas emission reduction methodology for uorinated compounds and N2O in the semiconductor industry via abatement systems

发布时间：2026-03-21点击次数：

DOI码：10.3389/fenrg.2023.1234486
发表刊物：Frontiers in Energy Research
关键字：Greenhouse gas (GHG), GHG emission reduction, Removal methodology, Semiconductor industry, Gas abatement system
摘要：Greenhouse gases (GHGs), particularly uorinated compounds (FCs), nitrous oxide (N2O), and nitrogen tri uoride (NF3), contribute signi cantly to climate change, and the semiconductor industry is a notable emitter of these gases. This report introduces an innovative methodology for GHG emission reduction in the semiconductor industry by utilizing advanced abatement systems, referencing Clean Development Mechanism (CDM) published methods AM0078 and AM0111. The proposed methodology shows promising potential, with substantial reductions in FCs, N2O, and NF3 emissions, positioning the semiconductor industry as a key player in climate change mitigation efforts. The main results indicate that by applying the latest abatement systems, a signi cant reduction in the targeted GHGs can be achieved. The methodology’s verification process cofirms the effectiveness of GHG reduction, ensuring that semiconductor manufacturing’s environmental impact is minimized. Our ndings suggest that the implementation of this methodology could lead to industry-wide adoption, resulting in a substantial contribution towards stabilizing atmospheric GHG concentrations.
是否译文：否
发表时间：2024-01-05
收录刊物：SCI

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