Patents
Current position: Home > Scientific Research > Patents
自适应地基不均匀沉降的框架支座
- Release time:2023-09-01
- Hits:
Affilication of Author(s):
力学与土木工程学院Scope of patent:
国内School Sign:
第一单位Disigner of the Invention:
bojianbiaoType of Patent:
国内State of Patent:
专利授权Application Number:
201810842056.XNumber of Inventors:
2Service Invention or Not:
noApplication Date:
2018-07-27Publication Date:
2018-08-27Authorization Date:
2021-02-19First Author:
xiajunwu
- Pre One:建筑物自适应地基不均匀沉降的方法及其结构
- Next One:一种光伏板与坡屋面的新型连接装置