中国矿业大学主页平台系统 Lingxiu Chen--Home Page-- Plasma-induced defects as nucleation sites for graphene on hexagonal boron nitride

Lingxiu Chen

Lingxiu Chen, Associate professor. Received bachelor's degree from China University of Mining and Technology, and received PhD degree from Shanghai Institute of Microsystems and Information Technology, Chinese Academy of Sciences. Supported by Shanghai Super Postdoctoral Program and China Postdoctoral Science Fundation. During this period, published important results in Nat. Mater., Nat. Co...Detials

Recommended Ph.D.Supervisor Recommended MA Supervisor

Paper Publications Current position: Home Page > Scientific Research > Paper Publications

Plasma-induced defects as nucleation sites for graphene on hexagonal boron nitride

Release time:2025-10-24 Hits:

DOI number:https://doi.org/10.1016/j.apsusc.2024.161169
Affiliation of Author(s):材料与物理学院
Funded by:自选课题
First Author:Lingxiu Chen
Co-author:孙清旭,孙宏宇,邬俊源,姜程鑫,zhangyang,shiliwei,王浩敏
Indexed by:Journal paper
Volume:Volume 679
ISSN No.:0169-4332
Translation or Not:no
Date of Publication:2025-01-15

Next One: Effect of hydrogen on graphene growth on SiC(0001) under atmospheric pressure